Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography
Abstract
A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.
- Inventors:
-
- Livermore, CA
- North Fitzroy, AU
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 874475
- Patent Number(s):
- 6398374
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G - PHYSICS G21 - NUCLEAR PHYSICS G21K - TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- condenser; ring-field; deep; ultraviolet; extreme; lithography; ripple-plate; mirror; illuminated; collimated; converging; beam; grazing; incidence; ripple; plate; flat; curved; formed; series; channels; axis; produce; concave; surfaces; undulating; pattern; light; incident; reflected; cones; distribution; slopes; leads; angles; reflection; form; extremes; slope; imaging; focuses; mask; plane; extreme ultraviolet; concave surface; /359/
Citation Formats
Chapman, Henry N, and Nugent, Keith A. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography. United States: N. p., 2002.
Web.
Chapman, Henry N, & Nugent, Keith A. Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography. United States.
Chapman, Henry N, and Nugent, Keith A. Tue .
"Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/874475.
@article{osti_874475,
title = {Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography},
author = {Chapman, Henry N and Nugent, Keith A},
abstractNote = {A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated or converging beam at grazing incidence. The ripple plate comprises a flat or curved plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}