Electrostatically screened, voltage-controlled electrostatic chuck
Abstract
Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.
- Inventors:
-
- San Ramon, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 873479
- Patent Number(s):
- 6169652
- Assignee:
- EUV, L.L.C. (Livermore, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- electrostatically; screened; voltage-controlled; electrostatic; chuck; employing; particularly; suited; holding; wafers; masks; sub-atmospheric; operations; significantly; reduce; likelihood; contaminant; deposition; substrates; insulator; block; outer; perimeter; planar; surface; adapted; support; substrate; comprising; electrode; typically; pair; electrodes; embedded; source; voltage; connected; base; attached; primary; shield; positioned; permits; control; lithographic; addition; provides; shielding; stray; electric; fields; issuing; effectively; prevents; wrapping; upper; front; eliminating; particle; significantly reduce; electrostatic chuck; particle deposition; particularly suited; electric field; planar surface; front surface; electric fields; outer perimeter; insulator block; surface adapted; prevents electric; support base; effectively prevents; voltage-controlled electrostatic; electrostatic particle; electrostatically screened; /361/
Citation Formats
Klebanoff, Leonard Elliott. Electrostatically screened, voltage-controlled electrostatic chuck. United States: N. p., 2001.
Web.
Klebanoff, Leonard Elliott. Electrostatically screened, voltage-controlled electrostatic chuck. United States.
Klebanoff, Leonard Elliott. Mon .
"Electrostatically screened, voltage-controlled electrostatic chuck". United States. https://www.osti.gov/servlets/purl/873479.
@article{osti_873479,
title = {Electrostatically screened, voltage-controlled electrostatic chuck},
author = {Klebanoff, Leonard Elliott},
abstractNote = {Employing an electrostatically screened, voltage-controlled electrostatic chuck particularly suited for holding wafers and masks in sub-atmospheric operations will significantly reduce the likelihood of contaminant deposition on the substrates. The electrostatic chuck includes (1) an insulator block having a outer perimeter and a planar surface adapted to support the substrate and comprising at least one electrode (typically a pair of electrodes that are embedded in the insulator block), (2) a source of voltage that is connected to the at least one electrode, (3) a support base to which the insulator block is attached, and (4) a primary electrostatic shield ring member that is positioned around the outer perimeter of the insulator block. The electrostatic chuck permits control of the voltage of the lithographic substrate; in addition, it provides electrostatic shielding of the stray electric fields issuing from the sides of the electrostatic chuck. The shielding effectively prevents electric fields from wrapping around to the upper or front surface of the substrate, thereby eliminating electrostatic particle deposition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}