Projection lithography with distortion compensation using reticle chuck contouring

Patent · Mon Jan 01 00:00:00 EST 2001

OSTI ID:873721

Tichenor, Daniel A ^[1]

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1. Castro Valley, CA

A chuck for holding a reflective reticle where the chuck has an insulator block with a non-planer surface contoured to cause distortion correction of EUV radiation is provided. Upon being placed on the chuck, a thin, pliable reflective reticle will conform to the contour of the chuck's non-planer surface. When employed in a scanning photolithography system, distortion in the scanned direction is corrected.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): US 6229871
• OSTI ID: 873721
• Country of Publication: United States
• Language: English

Related Subjects

projection
lithography
distortion
compensation
reticle
chuck
contouring
holding
reflective
insulator
block
non-planer
surface
contoured
correction
euv
radiation
provided
placed
pliable
conform
contour
employed
scanning
photolithography
scanned
direction
corrected
projection lithography
surface contour
euv radiation
insulator block
reflective reticle
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