Heating device for semiconductor wafers
Abstract
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernible pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light. 4 figs.
- Inventors:
- Issue Date:
- Sponsoring Org.:
- USDOE; USDOE, Washington, DC (United States)
- OSTI Identifier:
- 6433732
- Patent Number(s):
- 5930456
- Application Number:
- PPN: US 9-078865
- Assignee:
- AG Associates, San Jose, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 14 May 1998
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 42 ENGINEERING; DESIGN; HEAT TREATMENTS; LIGHT SOURCES; POSITIONING; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; MATERIALS; RADIATION SOURCES; 360601* - Other Materials- Preparation & Manufacture; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)
Citation Formats
Vosen, S R. Heating device for semiconductor wafers. United States: N. p., 1999.
Web.
Vosen, S R. Heating device for semiconductor wafers. United States.
Vosen, S R. Tue .
"Heating device for semiconductor wafers". United States.
@article{osti_6433732,
title = {Heating device for semiconductor wafers},
author = {Vosen, S R},
abstractNote = {An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the light energy sources are positioned such that many different radial heating zones are created on a wafer being heated. For instance, in one embodiment, the light energy sources form a spiral configuration. In an alternative embodiment, the light energy sources appear to be randomly dispersed with respect to each other so that no discernible pattern is present. In a third alternative embodiment of the present invention, the light energy sources form concentric rings. Tuning light sources are then placed in between the concentric rings of light. 4 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 27 00:00:00 EDT 1999},
month = {Tue Jul 27 00:00:00 EDT 1999}
}