Lamp system for uniform semiconductor wafer heating

Patent · Mon Jan 01 00:00:00 EST 2001

OSTI ID:873810

Zapata, Luis E ^[1]; Hackel, Lloyd ^[1]

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1. Livermore, CA

A lamp system with a very soft high-intensity output is provided over a large area by water cooling a long-arc lamp inside a diffuse reflector of polytetrafluorethylene (PTFE) and titanium dioxide (TiO.sub.2) white pigment. The water is kept clean and pure by a one micron particulate filter and an activated charcoal/ultraviolet irradiation system that circulates and de-ionizes and biologically sterilizes the coolant water at all times, even when the long-arc lamp is off.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 6252203
• OSTI ID: 873810
• Country of Publication: United States
• Language: English

Related Subjects

lamp
uniform
semiconductor
wafer
heating
soft
high-intensity
output
provided
water
cooling
long-arc
inside
diffuse
reflector
polytetrafluorethylene
ptfe
titanium
dioxide
white
pigment
kept
clean
pure
micron
particulate
filter
activated
charcoal
ultraviolet
irradiation
circulates
de-ionizes
biologically
sterilizes
coolant
times
coolant water
activated charcoal
semiconductor wafer
titanium dioxide
particulate filter
water cooling
ultraviolet irradiation
long-arc lamp
diffuse reflector
soft high-intensity
uniform semiconductor
high-intensity output
lamp inside
/219/118/362/392/