Objective for EUV microscopy, EUV lithography, and x-ray imaging
Abstract
Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.
- Inventors:
- Issue Date:
- Research Org.:
- Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1250448
- Patent Number(s):
- 9329487
- Application Number:
- 14/465,404
- Assignee:
- Bitter; Manfred (Princeton, NJ)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC02-09CH11466
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2014 Aug 21
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
Citation Formats
Bitter, Manfred, Hill, Kenneth W., and Efthimion, Philip. Objective for EUV microscopy, EUV lithography, and x-ray imaging. United States: N. p., 2016.
Web.
Bitter, Manfred, Hill, Kenneth W., & Efthimion, Philip. Objective for EUV microscopy, EUV lithography, and x-ray imaging. United States.
Bitter, Manfred, Hill, Kenneth W., and Efthimion, Philip. Tue .
"Objective for EUV microscopy, EUV lithography, and x-ray imaging". United States. https://www.osti.gov/servlets/purl/1250448.
@article{osti_1250448,
title = {Objective for EUV microscopy, EUV lithography, and x-ray imaging},
author = {Bitter, Manfred and Hill, Kenneth W. and Efthimion, Philip},
abstractNote = {Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue May 03 00:00:00 EDT 2016},
month = {Tue May 03 00:00:00 EDT 2016}
}
Works referenced in this record:
Schwarzschild objective for soft x-rays
journal, August 2000
- Krymski, Kirill M.
- Optical Engineering, Vol. 39, Issue 8
Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths
conference, August 2001
- Shumway, Michael D.; Lee, Sang Hun; Cho, Chang H.
- 26th Annual International Symposium on Microlithography, SPIE Proceedings
Multilayer roughness and image formation in the Schwarzschild objective
journal, September 1996
- Singh, S.; Solak, H.; Cerrina, F.
- Review of Scientific Instruments, Vol. 67, Issue 9
Analytical design method for a modified Schwarzschild optics
journal, January 2006
- Budano, Antonio; Flora, Francesco; Mezi, Luca
- Applied Optics, Vol. 45, Issue 18
Analysis of the applications of the Schwarzschild objective in the soft x-ray and VUV spectral ranges. 2. Diffraction modelling of aberrations
journal, February 1997
- Malyutin, A. A.
- Quantum Electronics, Vol. 27, Issue 2
Monochromatic x-ray backlighting of wire-array z -pinch plasmas using spherically bent quartz crystals
journal, March 2003
- Sinars, D. B.; Cuneo, M. E.; Bennett, G. R.
- Review of Scientific Instruments, Vol. 74, Issue 3
Monochromatic x-ray imaging with bent crystals for laser fusion research
journal, January 2001
- Fujita, K.; Nishimura, H.; Niki, I.
- Review of Scientific Instruments, Vol. 72, Issue 1
Design and analysis of a Schwarzschild imaging multilayer x-ray microscope
journal, January 1990
- Shealy, David L.
- Optical Engineering, Vol. 29, Issue 7
Design and analysis of soft x-ray imaging microscopes
conference, January 1992
- Shealy, David L.; Wang, Cheng; Jiang, Wu
- San Diego, '91, San Diego, CA, SPIE Proceedings
Optical Analysis of an Ultra-High Resolution Two-Mirror Soft X-Ray Microscope
journal, January 1995
- Shealy, David L.; Wang, Cheng; Hoover, Richard B.
- Journal of X-Ray Science and Technology, Vol. 5, Issue 1
Design Of An Imaging Microscope For Soft X-Ray Applications
conference, December 1988
- Hoover, Richard B.; Shealy, D. avid L.; Gabardi, David R.
- 32nd Annual Technical Symposium, SPIE Proceedings
Schwarzschild objective and similar two-mirror systems
conference, December 2012
- Artyukov, Igor A.
- Short-Wavelength Imaging and Spectroscopy, SPIE Proceedings
Conventional and modified Schwarzschild objective for EUV lithography: design relations
journal, August 2006
- Bollanti, S.; Di Lazzaro, P.; Flora, F.
- Applied Physics B, Vol. 85, Issue 4
A new scheme for stigmatic x-ray imaging with large magnification
journal, October 2012
- Bitter, M.; Hill, K. W.; Delgado-Aparicio, L. F.
- Review of Scientific Instruments, Vol. 83, Issue 10
Method and apparatus for producing monochromatic radiography with a bent laue crystal
patent, March 2000
- Zhong, Zhong; Chapman, Leonard; Thomlinson, William C.
- US Patent Document 6,038,285
Non-astigmatic imaging with matched pairs of spherically bent reflectors
patent, July 2012
- Bitter, Manfred; Hill, Kenneth W.; Scott, Steven Douglas
- US Patent Document 8,217,353