High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Janke, Christopher J; Lopata, Vincent J; Havens, Stephen J; Dorsey, George F; Moulton, Richard J

Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

Patent · Fri Jan 01 00:00:00 EST 1999

OSTI ID:872174

Janke, Christopher J ^[1]; Lopata, Vincent J ^[2]; Havens, Stephen J ^[3]; Dorsey, George F ^[4]; Moulton, Richard J ^[5]

Powell, TN
Manitoba, CA
Knoxville, TN
Farragut, TN
Lafayette, CA

A mixture of epoxy resins such as a semi-solid triglycidyl ether of tris (hydroxyphenyl) methane and a low viscosity bisphenol A glycidyl ether and a cationic photoinitiator such as a diaryliodonium salt is cured by irradiating with a dosage of electron beams from about 50 to about 150 kGy, forming a cross-linked epoxy resin polymer.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

DOE Contract Number:: AC05-84OR21400

Assignee:: Lockheed Martin Energy Systems, Inc. (Oak Ridge, TN)

Patent Number(s):: US 5877229

OSTI ID:: 872174

Country of Publication:: United States

Language:: English

References (12)

High-Energy-Radiation-Induced Cationic Polymerization of Vinyl Ethers in the Presence of Onium Salt Initiators Sundell, Per-Erik; Jönsson, Sonny; Hult, Anders ACS Symposium Series https://doi.org/10.1021/bk-1990-0417.ch032	book	December 1990
The electron beam-induced cationic polymerization of epoxy resins Crivello, James V.; Fan, Mingxin; Bi, Daoshen Journal of Applied Polymer Science, Vol. 44, Issue 1 https://doi.org/10.1002/app.1992.070440102	journal	January 1992
Radiation curing of an epoxy-acrylate-6,7-epoxy-3,7-dimethyloctyl acrylate Batten, Richard J.; Davidson, R. Stephen; Wilkinson, Susan A. Journal of Photochemistry and Photobiology A: Chemistry, Vol. 58, Issue 1 https://doi.org/10.1016/1010-6030(91)87102-2	journal	April 1991
Electron-beam-induced polymerization of epoxides Stephen Davidson, R.; Wilkinson, Susan A. Journal of Photochemistry and Photobiology A: Chemistry, Vol. 58, Issue 1 https://doi.org/10.1016/1010-6030(91)87103-3	journal	April 1991
New High‐Resolution and High‐Sensitivity Deep UV, X‐Ray, and Electron‐Beam Resists Hatzakis, M.; Stewart, K. J.; Shaw, J. M. Journal of The Electrochemical Society, Vol. 138, Issue 4 https://doi.org/10.1149/1.2085718	journal	April 1991
Electron beam curing of bisphenol A epoxy resins. [ビスフェノールＡ型エポキシ樹脂の電子線硬化] Okada, Toshio; Asano, Tsutomu; Hatada, Motoyoshi KOBUNSHI RONBUNSHU, Vol. 44, Issue 10 https://doi.org/10.1295/koron.44.761	journal	January 1987
Photo- and thermoinitiated curing of epoxy resins by sulfonium salts Stapp, Bernhard; Schön, Lothar; Bayer, Heiner Angewandte Makromolekulare Chemie, Vol. 209, Issue 1, p. 197-212 https://doi.org/10.1002/apmc.1993.052090118	journal	July 1993
Plasticization and antiplasticization effects of sulphonium salt initiator fragments remaining in cycloaliphatic epoxy resins cured by electron beam and ultraviolet irradiation Udagawa, Atsushi; Yamamoto, Yasuhiko; Inoue, Yoshio Polymer, Vol. 33, Issue 2 https://doi.org/10.1016/0032-3861(92)90983-4	journal	January 1992
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists Hatzakis, Michael; Stewart, Kevin J.; Shaw, Jane M. Microelectronic Engineering, Vol. 11, Issue 1-4 https://doi.org/10.1016/0167-9317(90)90156-N	journal	April 1990
Simple negative resist for deep ultraviolet, electron beam, and x-ray lithography Stewart, K. J. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6 https://doi.org/10.1116/1.584448	journal	November 1989
Chemistry & technology of UV & EB formulation for coatings, Inks & paints. Vol. 5: Speciality finishes Comyn, J. International Journal of Adhesion and Adhesives, Vol. 15, Issue 1 https://doi.org/10.1016/0143-7496(95)90055-1	journal	January 1995
Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist Glezos, N. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 10, Issue 6 https://doi.org/10.1116/1.586335	journal	November 1992

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Related Subjects

energy
electron
beam
curing
epoxy
resin
systems
incorporating
cationic
photoinitiators
mixture
resins
semi-solid
triglycidyl
tris
hydroxyphenyl
methane
viscosity
bisphenol
glycidyl
photoinitiator
diaryliodonium
salt
cured
irradiating
dosage
beams
50
150
kgy
forming
cross-linked
polymer
cationic photoinitiators
electron beam
electron beams
energy electron
epoxy resin
epoxy resins
cross-linked epoxy
cationic photoinitiator
/522/

Title: High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators

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References (12)

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