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Title: Annealing study of the electron-irradiation-induced defects H sub 4 and E sub 11 in InP: Defect transformation ( H sub 4 - E sub 11 ) r arrow H sub 4 sup prime

Journal Article · · Physical Review, B: Condensed Matter; (USA)
; ;  [1]
  1. Groupe d'Etude des Semiconducteurs, Universite Sciences et Techniques Languedoc, place E. Bataillon, 34060 Montpellier CEDEX, France (FR)

Capacitance spectroscopy has been used to study the two dominant deep levels, {ital H}{sub 4} and {ital E}{sub 11}, produced in InP by low-energy electron irradiation. The annealing rates of {ital H}{sub 4} and {ital E}{sub 11} in the {ital p}-type material are found to be identical, as is also the dependence on free-carrier recombination and on the chemical nature of the acceptor (Cd or Zn). Recombination-enhanced annealing converts these traps to a hole trap {ital H}{sub 4}{sup {prime}}, which is not detectable by conventional deep-level transient spectroscopy. Its emission and capture properties are measured and analyzed. The similarity of the creation and annealing behavior of {ital H}{sub 4} and {ital E}{sub 11} shows that they share a common point defect. Our results lead to the tentative identification of the defect as a phosphorous vacancy-acceptor complex and we show how this may anneal to the {ital H}{sub 4}{sup {prime}} center.

OSTI ID:
7004343
Journal Information:
Physical Review, B: Condensed Matter; (USA), Vol. 41:2; ISSN 0163-1829
Country of Publication:
United States
Language:
English