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Title: Deep level transient spectroscopy study of proton irradiated p -type InP

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.348856· OSTI ID:5615932
 [1];  [2]
  1. SFA Inc., Landover, Maryland 20785 (USA)
  2. Naval Research Laboratory, Washington, DC 20375 (USA) Department of Physics, University of Maryland, Baltimore County, Baltimore, Maryland 21228 (USA)

A deep level transient spectroscopy study of proton irradiation induced defects in {ital n}{sup +}{ital p} InP mesa diodes grown by metalorganic chemical vapor deposition is reported. In contrast to results reported for InP grown by other methods, 3 MeV proton irradiation produced a DLTS spectrum similar to 1 MeV electron irradiation with the addition of two new peaks. Six majority carrier peaks: {ital HP}1({ital E}{sub {ital a}}=0.15 eV), {ital H}2({ital E}{sub {ital a}}=0.20 eV), {ital H}3({ital E}{sub {ital a}}=0.30 eV), {ital H}4({ital E}{sub {ital a}}=0.37 eV), {ital H}5({ital E}{sub {ital a}}=0.54 eV), and {ital H}7({ital E}{sub {ital a}}=0.61 eV) and three minority carrier peaks: {ital EA}({ital E}{sub {ital a}}=0.26 eV), {ital EB}({ital E}{sub {ital a}}=0.74 eV), and {ital EC}({ital E}{sub {ital a}}=0.16 eV) were detected. The {ital H}5 peak displayed a thermally activated capture cross section and a dependence of peak height on injection level. Isothermal annealing at 375 K was performed and thermal annealing rates are presented. Low temperature (200 K), minority carrier injection annealing rates are also presented. For most of the defects, a significant residual concentration remained after injection which could not be annealed further. An equation was developed for the annealing rate of the major defect, {ital H}4, as a function of injection level, carrier concentration, and temperature.

OSTI ID:
5615932
Journal Information:
Journal of Applied Physics; (USA), Vol. 69:9; ISSN 0021-8979
Country of Publication:
United States
Language:
English