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Title: Corrosion behavior of tantalum and niobium in hydrobromic acid solutions (II) on passive films and hydrogen absorption

Journal Article · · Corrosion (Houston); (USA)
OSTI ID:6910234
; ; ;  [1]
  1. Government Industrial Research Institute, Osaka Midorigaoka, 1-8-31, Ikeda-shi, Osaka 563 (JP)

The authors report the corrosion behavior of tantalum (Ta) and niobium (Nb) in hydrobromic acid solutions studied with respect to their surface states and hydrizing by scanning electron microscopy (SEM), x-ray photoelectron spectroscopy (XPS), a hydrogen determinator, and x-ray diffraction (XRD). The test specimens were immersed in a 47 wt% HBr solution bubbled with hydrogen and in another that contained 0.05 mol/dm{sup 3} of bromine at 25 and 100{degrees}C for 15, 30, and 45 days. On Ta under every condition and Nb at 25{degrees}C, the surface films consisting of their pentoxides thickened with increasing immersion time and exhibited no significant change in appearance or hydrogen content. However, fine pits less than 5{mu} in diameter were formed on Nb specimens in both the solutions at 100{degrees}C at the early stage of immersion. In the solution with hydrogen, the pitting extended over the specimen surfaces with increasing immersion time, and developed into general corrosion after 45 days. Progress of pitting was terminated in 15 days in the solution with bromine.

OSTI ID:
6910234
Journal Information:
Corrosion (Houston); (USA), Vol. 45:7; ISSN 0010-9312
Country of Publication:
United States
Language:
English