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Title: Program of research on microfabrication techniques for VLSI magnetic devices. Final report, 1 October 1983-30 September 1984

Technical Report ·
OSTI ID:6042761

New materials, new fabrication techniques and new device structures for high density magnetic bubble devices were developed. The main focus of the work has been to develop ion-implanted contiguous disk devices offering sixteen times the bit density of presently manufactured bubble devices and chip capacities of 64 Mbit. Under this contract, the authors developed a computer program for modeling magnetic bubble garnet materials and applied it to the design of bubble materials having isotropic magnetostriction. They have previously show that such materials would provide better device operating characteristics. During the past year they also modeled the anisotropic stresses around ion-implanted propagation patterns and showed how they produce nonuniform anisotropies due to magnetostrictive effects.

Research Organization:
Carnegie-Mellon Univ., Pittsburgh, PA (USA)
OSTI ID:
6042761
Report Number(s):
AD-A-161271/2/XAB
Country of Publication:
United States
Language:
English