Continuous vacuum processing system for quartz crystal resonators
An ultrahigh vacuum continuous cycle quartz crystal fabrication facility has been developed that assures an essentially contamination-free environment throughout the final manufacturing steps of the crystal unit. The system consists of five essentially tubular vacuum chambers that are interconnected through gate valves. The unplated crystal resonators, mounted in ceramic flatback frames and loaded on carrier trays, enter the vacuum system through an entrance air lock, are UV/ozone cleaned, baked at 300/sup 0/C, plated to frequency, thermocompression sealed, and exit as completed crystal units through an exit air lock, while the bake, plate and seal chambers remain under continuous vacuum permanently. In-line conveyor belts are used, in conjunction with balanced vacuum manipulators, to move the resonator components to the various work stations. Unique high density, highly directional nozzle beam evaporation sources, capable of long term operation without reloading, are used for electroding the resonators simultaneously on both sides. The design goal for the system is a production rate of 200 units per 8 hour day; it is adaptable to automatic operation.
- Research Organization:
- General Electric Co., St. Petersburg, FL (USA). Neutron Devices Dept.; Army Electronics Technology and Devices Lab., Fort Monmouth, NJ (USA)
- DOE Contract Number:
- EY-76-C-04-0656
- OSTI ID:
- 5618917
- Report Number(s):
- GEPP-OP-439; CONF-790554-2; TRN: 80-005786
- Resource Relation:
- Conference: 33. annual symposium on frequency control, Atlantic City, NJ, USA, 30 May 1979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Quartz crystal fabrication facility. First semiannual report, October 1976--March 1977
Vacuum processing system for quartz-crystal resonators
Related Subjects
RESONATORS
FABRICATION
VACUUM SYSTEMS
DESIGN
OPERATION
CRYSTALS
QUARTZ
SEALING MATERIALS
ULTRAHIGH VACUUM
CHALCOGENIDES
ELECTRONIC EQUIPMENT
OXIDES
OXYGEN COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
420800* - Engineering- Electronic Circuits & Devices- (-1989)
420700 - Engineering- Vacuum Engineering- (-1987)