Modification of cathodic arc deposition profiles by magnetic multicusps

Conference · Tue Dec 31 00:00:00 EST 1996

OSTI ID:441560

Anders, S; MacGill, R A; Raoux, S; Brown, I G ^[1]

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1. Lawrence Berkeley National Lab., CA (United States)

The deposition profile of a cathodic arc plasma source with and without magnetic macroparticle filter has been measured using a deposition probe technique. It has been found that the profile is close to a Gaussian and that the width of the profile depends on the cathode material. It was found that the dependence on the cathode material leads to a considerable radial variation of the elemental composition of the film when an alloy cathode is used. A magnetic multicusp field (magnetic bucket) near the exit of the plasma source or the magnetic filter was applied to flatten and homogenize the deposition profile.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 441560
• Report Number(s): CONF-960723-; TRN: 96:006574-0033
• Resource Relation: Conference: 17. international symposium on discharges and electrical insulation in vacuum, Berkeley, CA (United States), 21-26 Jul 1996; Other Information: PBD: 1996; Related Information: Is Part Of XVIIth international symposium on discharges and electrical insulation in vacuum. Volume 1 and 2; PB: 1139 p.
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
PLASMA ARC SPRAYING
MAGNETIC FILTERS
BEAM PROFILES
CATHODE SPUTTERING
VAPOR DEPOSITED COATINGS
CONTROL