Modification of cathodic arc deposition profiles by magnetic multicusps
The deposition profile of a cathodic arc plasma source with and without magnetic macroparticle filter has been measured using a deposition probe technique. It has been found that the profile is close to a Gaussian and that the width of the profile depends on the cathode material. It was found that the dependence on the cathode material leads to a considerable radial variation of the elemental composition of the film when an alloy cathode is used. A magnetic multicusp field (magnetic bucket) near the exit of the plasma source or the magnetic filter was applied to flatten and homogenize the deposition profile.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Electric Power Research Inst., Palo Alto, CA (United States); Department of Defense, Washington, DC (United States); USDOE Office of Energy Research, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 414369
- Report Number(s):
- LBL-37948; CONF-960723-7; ON: DE97001217; CNN: Award 8042-03; ARO118-95; TRN: AHC29701%%68
- Resource Relation:
- Conference: 17. international symposium on discharges and electrical insulation in vacuum, Berkeley, CA (United States), 21-26 Jul 1996; Other Information: PBD: Apr 1996
- Country of Publication:
- United States
- Language:
- English
Similar Records
Modification of cathodic arc deposition profiles by magnetic multicusps
Plasma distribution of cathodic arc deposition systems
Plasma distribution of cathodic ARC deposition system
Conference
·
Tue Dec 31 00:00:00 EST 1996
·
OSTI ID:414369
+1 more
Plasma distribution of cathodic arc deposition systems
Journal Article
·
Wed May 01 00:00:00 EDT 1996
· Journal of Applied Physics
·
OSTI ID:414369
+2 more
Plasma distribution of cathodic ARC deposition system
Conference
·
Thu Aug 01 00:00:00 EDT 1996
·
OSTI ID:414369
+2 more