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Title: InGaAsNSb/GaAs quantum wells for 1.55 {mu}m lasers grown by molecular-beam epitaxy

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1379787· OSTI ID:40204555

InGaAsNSb/GaAs quantum wells (QWs) were grown by solid-source molecular-beam epitaxy using a N{sub 2} radio frequency plasma source. The effect of adding Sb during growth of InGaAsN/GaAs QWs was studied. X-ray diffraction, reflection high-energy electron diffraction and transmission electron microscopy studies indicate that Sb suppresses the three-dimensional growth and improves the interface of the QWs. X-ray diffraction and secondary ion mass spectroscopy analysis show that Sb gets incorporated into the quantum well, which becomes a quinternary compound that was previously unexplored. The introduction of Sb during growth of InGaAsN/GaAs QWs significantly enhances the optical properties of the QWs. 1.53 {mu}m room-temperature photoluminescence was obtained from InGaAsNSb/GaAs QWs, which demonstrates the potential of fabricating 1.55 {mu}m InGaAsNSb/GaAs QW lasers for long-haul applications. {copyright} 2001 American Institute of Physics.

Sponsoring Organization:
(US)
OSTI ID:
40204555
Journal Information:
Applied Physics Letters, Vol. 78, Issue 26; Other Information: DOI: 10.1063/1.1379787; Othernumber: APPLAB000078000026004068000001; 006125APL; PBD: 25 Jun 2001; ISSN 0003-6951
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English