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Title: Titanium nitride coated tungsten cold field emission sources

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
DOI:https://doi.org/10.1116/1.588668· OSTI ID:399789
; ; ; ; ;  [1]
  1. Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States)

Titanium nitride (TiN) thin film coatings were studied by field emission microscopy and spectroscopy. Coated tungsten tips were found to be capable of emitting extremely high currents at low extraction voltages ({approximately}1 mA at 900{endash}1700 V). Current fluctuations for {gt}400 {mu}A total emission from a single tip were 7{percent} rms, measured over {approximately} 1 h. Electron energy distributions measured {lt}0.4 eV (full width at half-maximum). Since TiN thin films are commonly used in the microelectronics industry, TiN coatings have the potential for being a relatively simple and widely accessible method for improving the performance of cold field emission sources. {copyright} {ital 1996 American Vacuum Society}

OSTI ID:
399789
Report Number(s):
CONF-960582-; ISSN 0734-211X; TRN: 96:030064
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 14, Issue 6; Conference: 40. international conference on electron, ion and photon beam technology and nanofabrication, Atlanta, GA (United States), 28-31 May 1996; Other Information: PBD: Nov 1996
Country of Publication:
United States
Language:
English

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