Maximum drift velocity of electrons in selectively doped InAlAs/InGaAs/InAlAs heterostructures with InAs inserts
- Center for Physical Sciences and Technology, Semiconductor Physics Institute (Lithuania)
- Russian Academy of Sciences, Institute of Microwave Semiconductor Electronics (Russian Federation)
The dependence of the electron mobility and drift velocity on the growth conditions, thickness, and doping of an InAs insert placed at the center of the quantum well in a selectively doped InAlAs/InGaAs/InAlAs heterostructure has been investigated. Record enhancement of the maximum drift velocity to (2-4) Multiplication-Sign 10{sup 7} cm/s in an electric field of 5 Multiplication-Sign 10{sup 3} V/cm has been obtained in a 17-nm-wide quantum well with an undoped 4-nm-thick InAs insert. In the structures with additional doping of the InAs insert, which facilitates an increase in the density of electrons in the quantum well to 4.0 Multiplication-Sign 10{sup 12} cm{sup -2}, the maximum drift velocity is as high as 2 Multiplication-Sign 10{sup 7} cm/s in an electric field of 7 Multiplication-Sign 10{sup 3} V/cm.
- OSTI ID:
- 22105542
- Journal Information:
- Semiconductors, Vol. 47, Issue 3; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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