Ion implantation in glasses: Mechanical modifications
Implantation into glasses induces surface stresses which affect mechanical properties. These stresses can be conveniently measured by cantilever beam techniques. For fused silica and other simple silicate glasses, the stress for various ions scales with collisional energy deposition. For complex borosilicates, electronic processes are dominant in establishing stress. For fused silica, stress and hardness (and other physical properties) achieve maximum change at about 2 {times} 10{sup 20} keV/cm{sup 3} and then decrease. For fused silica and other silicates, a second critical energy deposition is found at {approximately}10{sup 23} keV/cm{sup 3} above which many properties (including hardness) exhibit changes associated with an extended damage range. Mechanical properties are greatly altered by implant-induced (N,B) compound formation. Crystallization of the implanted layer can also bring about large increases in surface hardness.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 10115539
- Report Number(s):
- SAND-91-1443C; CONF-911109-8; ON: DE92005460
- Resource Relation:
- Conference: Fall meeting of the European Materials Research Society (EMRS),Strasbourg (France),5-8 Nov 1991; Other Information: PBD: [1991]
- Country of Publication:
- United States
- Language:
- English
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