Cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror

Journal Article · Wed Sep 15 00:00:00 EDT 2010 · Nuclear Inst. and Methods in Physics Research, A

OSTI ID:991750

Yuan, Sheng Sam; Goldberg, Kenneth A; Yashchuk, Valeriy V; Celestre, Richard; McKinney, Wayne R; Morrison, Gregory; Macdougall, James; Mochi, Iacopo; Warwick, Tony

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in-situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. In this paper, we report an initial cross-check of ex-situ and in-situ metrology of a bendable temperature stabilized KB mirror. This cross-check provides a validation of the in-situ shearing interferometry currently under development at the ALS.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: Advanced Light Source Division
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 991750
• Report Number(s): LBNL-3972E; NIMAER; TRN: US1007558
• Journal Information: Nuclear Inst. and Methods in Physics Research, A, Conference: PhotonDiag2010 workshop held in Hamburg, Hamburg, Germany; ISSN 0168-9002
• Country of Publication: United States
• Language: English

Related Subjects

47
ADVANCED LIGHT SOURCE
INTERFEROMETRY
MIRRORS
VALIDATION
x-ray
synchrotron radiation
free electron laser
KB mirror
metrology
wavefront measurements
shearing interferometry
optical slope metrology
long trace profiler