Calibration of the modulation transfer function of surface profilometers with binary pseudo-random test standards: Expanding the application range

Conference · Mon Jul 26 00:00:00 EDT 2010

OSTI ID:985847

Yashchuk, Valeriy V; Anderson, Erik H; Barber, Samuel K; Bouet, Nathalie; Cambie, Rossana; Conley, Raymond; McKinney, Wayne R; Takacs, Peter Z; Voronov, Dmitriy L

A modulation transfer function (MTF) calibration method based on binary pseudo-random (BPR) gratings and arrays [Proc. SPIE 7077-7 (2007), Opt. Eng. 47(7), 073602-1-5 (2008)] has been proven to be an effective MTF calibration method for a number of interferometric microscopes and a scatterometer [Nucl. Instr. and Meth. A 616, 172-82 (2010]. Here we report on a significant expansion of the application range of the method. We describe the MTF calibration of a 6 inch phase shifting Fizeau interferometer. Beyond providing a direct measurement of the interferometer's MTF, tests with a BPR array surface have revealed an asymmetry in the instrument's data processing algorithm that fundamentally limits its bandwidth. Moreover, the tests have illustrated the effects of the instrument's detrending and filtering procedures on power spectral density measurements. The details of the development of a BPR test sample suitable for calibration of scanning and transmission electron microscopes are also presented. Such a test sample is realized as a multilayer structure with the layer thicknesses of two materials corresponding to BPR sequence. The investigations confirm the universal character of the method that makes it applicable to a large variety of metrology instrumentation with spatial wavelength bandwidths from a few nanometers to hundreds of millimeters.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: Advanced Light Source Division; Engineering Division; Materials Sciences Division
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 985847
• Report Number(s): LBNL-3707E; TRN: US201016%%2286
• Resource Relation: Conference: Advances in Metrology for X-Ray and EUV Optics II (OP320), Part of the SPIE International Symposium Optics and Photonics 2010 on SPIE optical Engineering and Applications , San Diego, California, August 1-5, 2010
• Country of Publication: United States
• Language: English

Related Subjects

47
ALGORITHMS
ASYMMETRY
CALIBRATION
DATA PROCESSING
ELECTRON MICROSCOPES
MICROSCOPES
MODULATION
OPTICS
SPECTRAL DENSITY
TRANSFER FUNCTIONS
WAVELENGTHS
surface metrology
surface profilometer
interferometric microscope
modulation transfer function
power spectral density
calibration
error reduction
fabrication tolerances
metrology of x-ray optics