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Title: Residual-gas-ionization beam profile monitors in RHIC

Conference ·
OSTI ID:981452

Four ionization profile monitors (IPMs) are in RHIC to measure vertical and horizontal beam profiles in the two rings. These work by measuring the distribution of electrons produced by beam ionization of residual gas. During the last two years both the collection accuracy and signal/noise ratio have been improved. An electron source is mounted across the beam pipe from the collector to monitor microchannel plate (MCP) aging and the signal electrons are gated to reduce MCP aging and to allow charge replenishment between single-turn measurements. Software changes permit simultaneous measurements of any number of individual bunches in the ring. This has been used to measure emittance growth rates on six bunches of varying intensities in a single store. Also the software supports FFT analysis of turn-by-turn profiles of a single bunch at injection to detect dipole and quadrupole oscillations.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States). Relativistic Heavy Ion Collider (RHIC)
Sponsoring Organization:
Doe - Office Of Science
DOE Contract Number:
DE-AC02-98CH10886
OSTI ID:
981452
Report Number(s):
BNL-91049-2010-CP; R&D Project: KBCH139; KB0202011; TRN: US201012%%1268
Resource Relation:
Conference: 2010 Beam Instrumentation Workshop (BIW10); Santa Fe, New Mexcio; 20100502 through 20100506
Country of Publication:
United States
Language:
English

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