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Title: Microelectromechanical resonator and method for fabrication

Patent ·
OSTI ID:978872

A method is disclosed for the robust fabrication of a microelectromechanical (MEM) resonator. In this method, a pattern of holes is formed in the resonator mass with the position, size and number of holes in the pattern being optimized to minimize an uncertainty .DELTA.f in the resonant frequency f.sub.0 of the MEM resonator due to manufacturing process variations (e.g. edge bias). A number of different types of MEM resonators are disclosed which can be formed using this method, including capacitively transduced Lame, wineglass and extensional resonators, and piezoelectric length-extensional resonators.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
7,652,547
Application Number:
12/269,094
OSTI ID:
978872
Country of Publication:
United States
Language:
English

References (5)

Robust Design and Model Validation of Nonlinear Compliant Micromechanisms journal February 2006
MEMS resonators that are robust to process-induced feature width variations journal October 2002
Square-Extensional Mode Single-Crystal Silicon Micromechanical Resonator for Low-Phase-Noise Oscillator Applications journal April 2004
A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators
  • Hsu, W. -T.; Clark, J. R.; Nguyen, C. T. -C.
  • Technical Digest MEMS 2001 14th IEEE International Conference on Micro Electro Mechanical Systems, Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090) https://doi.org/10.1109/MEMSYS.2001.906550
conference January 2001
Design of microresonators under uncertainty journal February 2005

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