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Title: Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates

Patent ·
OSTI ID:970494

The invention includes methods of forming a metallic coating on a substrate which contains silicon. A metallic glass layer is formed over a silicon surface of the substrate. The invention includes methods of protecting a silicon substrate. The substrate is provided within a deposition chamber along with a deposition target. Material from the deposition target is deposited over at least a portion of the silicon substrate to form a protective layer or structure which contains metallic glass. The metallic glass comprises iron and one or more of B, Si, P and C. The invention includes structures which have a substrate containing silicon and a metallic layer over the substrate. The metallic layer contains less than or equal to about 2 weight % carbon and has a hardness of at least 9.2 GPa. The metallic layer can have an amorphous microstructure or can be devitrified to have a nanocrystalline microstructure.

Research Organization:
Idaho National Laboratory (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC07-99ID13727
Assignee:
Battelle Energy Alliance, LLC (Idaho Falls, ID)
Patent Number(s):
7,341,765
Application Number:
10/918,287
OSTI ID:
970494
Country of Publication:
United States
Language:
English

References (3)

Enhanced corrosion resistance in Nd15Fe77B8 by laser surface amorphization journal March 1989
Effect of group IV elements on the cutting characteristics of Ti(C,N) cermet tools and reliability analysis journal July 2005
Time-temperature-transformation diagram of a highly processable metallic glass journal May 1994

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