The effect of pulse duration on the growth rate of laser-induced damage sites at 351 nm on fused silica surfaces
Past work in the area of laser-induced damage growth has shown growth rates to be primarily dependent on the laser fluence and wavelength. More recent studies suggest that growth rate, similar to the damage initiation process, is affected by a number of additional parameters including pulse duration, pulse shape, site size, and internal structure. In this study, we focus on the effect of pulse duration on the growth rate of laser damage sites located on the exit surface of fused silica optics. Our results demonstrate, for the first time, a significant dependence of growth rate at 351 nm on pulse duration from 1 ns to 15 ns as {tau}{sup 0.3} for sites in the 50-100 {micro}m size range.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 970164
- Report Number(s):
- LLNL-CONF-420370; TRN: US201003%%403
- Resource Relation:
- Journal Volume: 7504; Conference: Presented at: Boulder Damage Symposium, Boulder, CA, United States, Sep 20 - Sep 23, 2009
- Country of Publication:
- United States
- Language:
- English
Similar Records
Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation
Growth of Laser Initiated Damage in Fused Silica at 351 nm
Growth of Laser Initiated Damage in Fused Silica at 527 nm
Conference
·
Fri Oct 24 00:00:00 EDT 2008
·
OSTI ID:970164
+7 more
Growth of Laser Initiated Damage in Fused Silica at 351 nm
Conference
·
Tue Jan 30 00:00:00 EST 2001
·
OSTI ID:970164
+9 more
Growth of Laser Initiated Damage in Fused Silica at 527 nm
Conference
·
Sat Nov 01 00:00:00 EST 2003
·
OSTI ID:970164
+2 more