Depth-resolved soft x-ray photoelectron emission microscopy in nanostructures via standing-wave excited photoemission

Journal Article · Mon Nov 24 00:00:00 EST 2008 · Physical Review Letters

DOI:https://doi.org/10.1063/1.3046782· OSTI ID:944129

Kronast, F; Ovsyannikov, R; Kaiser, A; Wiemann, C; Yang, S -H; Locatelli, A; Burgler, D E; Schreiber, R; Salmassi, F; Fischer, P; Durr, H A; Schneider, C M; Eberhardt, W; Fadley, C S

We present an extension of conventional laterally resolved soft x-ray photoelectron emission microscopy. A depth resolution along the surface normal down to a few {angstrom} can be achieved by setting up standing x-ray wave fields in a multilayer substrate. The sample is an Ag/Co/Au trilayer, whose first layer has a wedge profile, grown on a Si/MoSi2 multilayer mirror. Tuning the incident x-ray to the mirror Bragg angle we set up standing x-ray wave fields. We demonstrate the resulting depth resolution by imaging the standing wave fields as they move through the trilayer wedge structure.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: Materials Sciences Division
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 944129
• Report Number(s): LBNL-1247E; PRLTAO; TRN: US200902%%589
• Journal Information: Physical Review Letters, Journal Name: Physical Review Letters; ISSN 0031-9007
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BRAGG REFLECTION
MICROSCOPY
MIRRORS
NANOSTRUCTURES
PHOTOEMISSION
RESOLUTION
STANDING WAVES
TUNING