Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate
Abstract
A method of forming a nanostructure at low temperatures. A substrate that is reactive with one of atomic oxygen and nitrogen is provided. A flux of neutral atoms of at least one of nitrogen and oxygen is generated within a laser-sustained-discharge plasma source and a collimated beam of energetic neutral atoms and molecules is directed from the plasma source onto a surface of the substrate to form the nanostructure. The energetic neutral atoms and molecules in the plasma have an average kinetic energy in a range from about 1 eV to about 5 eV.
- Inventors:
-
- Los Alamos, NM
- Santa Fe, NM
- Publication Date:
- Research Org.:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 941667
- Patent Number(s):
- 7,393,762
- Application Number:
- 11/603,517
- Assignee:
- Los Alamos National Secruity, LLC (Los Alamos, NM)
- DOE Contract Number:
- W-7405-ENG-36
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Hoffbauer, Mark, and Mueller, Alex. Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate. United States: N. p., 2008.
Web.
Hoffbauer, Mark, & Mueller, Alex. Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate. United States.
Hoffbauer, Mark, and Mueller, Alex. 2008.
"Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate". United States. https://www.osti.gov/servlets/purl/941667.
@article{osti_941667,
title = {Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate},
author = {Hoffbauer, Mark and Mueller, Alex},
abstractNote = {A method of forming a nanostructure at low temperatures. A substrate that is reactive with one of atomic oxygen and nitrogen is provided. A flux of neutral atoms of at least one of nitrogen and oxygen is generated within a laser-sustained-discharge plasma source and a collimated beam of energetic neutral atoms and molecules is directed from the plasma source onto a surface of the substrate to form the nanostructure. The energetic neutral atoms and molecules in the plasma have an average kinetic energy in a range from about 1 eV to about 5 eV.},
doi = {},
url = {https://www.osti.gov/biblio/941667},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 01 00:00:00 EDT 2008},
month = {Tue Jul 01 00:00:00 EDT 2008}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Multicolor Light-Emitting Diodes Based on Semiconductor Nanocrystals Encapsulated in GaN Charge Injection Layers
journal, June 2005
- Mueller, Alexander H.; Petruska, Melissa A.; Achermann, Marc
- Nano Letters, Vol. 5, Issue 6