A constant gradient planar accelerating structure for linac use
Planar accelerating millimeter-wave structures have been studied during the last few years at Argonne National Laboratory in collaboration with Technical University of Berlin. The cavity structures are intended to be manufactured by using x-ray lithography microfabrication technology. A complete structure consists of two identical planar half structures put together face-to-face. Since microfabrication technology can make a since-depth indentation on a planar substrate, realizing the constant impedance structure was possible but a constant gradient structure was difficult; changing the group velocity along the structure while maintaining the gap and the depth of the indentation constant was difficult. A constant gradient structure has been devised by introducing a cut between the adjacent cavity cells along the beam axis of each half structure. The width of the cut is varied along the longitudinal axis of the structure to have proper coupling between the cells. The result of the computer simulation on such structures is shown.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 93661
- Report Number(s):
- ANL/ASD/CP-84995; CONF-950512-273; ON: DE95013731; TRN: 95:018469
- Resource Relation:
- Conference: 16. Institute of Electrical and Electronic Engineers (IEEE) particle accelerator conference, Dallas, TX (United States), 1-5 May 1995; Other Information: PBD: [1995]
- Country of Publication:
- United States
- Language:
- English
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