Reactive ion etched substrates and methods of making and using
Patent
·
OSTI ID:935039
- San Francisco, CA
- Oakland, CA
- New York, NY
Disclosed herein are substrates comprising reactive ion etched surfaces and specific binding agents immobilized thereon. The substrates may be used in methods and devices for assaying or isolating analytes in a sample. Also disclosed are methods of making the reactive ion etched surfaces.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 7,253,008
- OSTI ID:
- 935039
- Country of Publication:
- United States
- Language:
- English
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