Surface Roughness Characterization of Niobium Subjected to Incremental BCP and EP Processing Steps
Conference
·
OSTI ID:923389
The surface of niobium samples polished under incremental Buffered Chemical Polish (BCP) and Electro-Polishing (EP) have been characterized through Atomic Force Microscopy (AFM) and stylus profilometry across a range of length of scales. The results were analyzed using Power Density Spectral (PSD) technique to determine roughness and characteristic dimensions. This study has shown that the PSD method is a valuable tool that provides quantitative information about surface roughness at different length scales.
- Research Organization:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-06OR23177
- OSTI ID:
- 923389
- Report Number(s):
- JLAB-ACC-07-793; DOE/OR/23177-0314; TRN: US0801787
- Resource Relation:
- Conference: 13th Workshop on RF Superconductivity, Beijing, China, Oct. 14 - 19,
- Country of Publication:
- United States
- Language:
- English
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