Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage
Metal-containing tetrahedral amorphous carbon films wereproduced by dual filtered cathodic vacuum arc plasma sources operatedinsequentially pulsed mode. Negatively pulsed bias was applied to thesubstrate when carbon plasma was generated, whereas it was absentwhen themolybdenum plasma was presented. Film thickness was measured afterdeposition by profilometry. Glass slides with silver padswere used assubstrates for the measurement of the sheet resistance. Themicrostructure and composition of the films were characterizedbyRamanspectroscopy and Rutherford backscattering, respectively. It was foundthat the electrical resistivity decreases with an increaseof the Mocontent, which can be ascribed to an increase of the sp2 content and anincrease of the sp2 cluster size.
- Research Organization:
- COLLABORATION - MaiU./Thailand
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 913157
- Report Number(s):
- LBNL-61581-JArt; R&D Project: Z2PANC; BnR: 600301010; TRN: US200802%%559
- Journal Information:
- Nuclear Instruments and Methods of Physics ResearchB, Vol. 259; Related Information: Journal Publication Date: 2007
- Country of Publication:
- United States
- Language:
- English
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