Progress on PEEM3 - An Aberration Corrected X-Ray PhotoemissionElectron Microscope at the ALS

Conference · Sat May 20 00:00:00 EDT 2006

OSTI ID:899190

MacDowell, Alastair A; Feng, J; DeMello, A; Doran, A; Duarte, R; Forest, E; Kelez, N; Marcus, M A; Miller, T; Padmore, H A; Raoux, S; Robin, D; Scholl, A; Schlueter, R; Schmid, P; Stohr, J; Wan, W; Wei, D H; Wu, Y

A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed and built at the Advanced Light Source (ALS). An electron mirror combined with a much-simplified magnetic dipole separator is to be used to provide simultaneous correction of spherical and chromatic aberrations. It is installed on an elliptically polarized undulator (EPU) beamline, and will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials. The instrument has been designed and is described. The instrumental hardware is being deployed in 2 phases. The first phase is the deployment of a standard PEEM type microscope consisting of the standard linear array of electrostatic electron lenses. The second phase will be the installation of the aberration corrected upgrade to improve resolution and throughput. This paper describes progress as the instrument enters the commissioning part of the first phase.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director. Office of Science. Office of AdvancedScientific Computing Research. Office of Basic EnergySciences
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 899190
• Report Number(s): LBNL-60213; R&D Project: A580ES; BnR: KC0204016; TRN: US0701823
• Resource Relation: Conference: 9th International Conference on SynchrotronRadiation Instrumentation, DAEGU, Korea, May 28 - June 22006
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
47 OTHER INSTRUMENTATION
ADVANCED LIGHT SOURCE
CHROMATIC ABERRATIONS
COMMISSIONING
ELECTRON MICROSCOPES
ELECTRONS
ELECTROSTATICS
LENSES
MAGNETIC DIPOLES
MAGNETIC PROPERTIES
MICROSCOPES
MIRRORS
PHOTOEMISSION
RESOLUTION
SPATIAL RESOLUTION
SYNCHROTRON RADIATION
WIGGLER MAGNETS
Photoemission Electron Microscope PEEM AberrationCorrection