skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy

Abstract

Raman spectroscopy can be performed with micrometer resolution and can thus be used to determine the dependence of oxide thickness on the substrate's grain structure or local impurity inclusions. The Raman signal amplitude emitted from an epitaxial uranium oxide layer as a function of oxide thickness has been modeled for light of 632.8 nm wavelength incident on the oxide and reflected from the uranium substrate using the optical properties determined by spectrophotometry. The model shows that the Raman signal increases with oxide thickness and saturates at about 150 nm thickness. The model was compared with the measured Raman signal amplitude of an epitaxial uranium oxide layer growing in air with a known time dependence of oxide growth.

Authors:
;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
883532
Report Number(s):
UCRL-CONF-217799
Journal ID: ISSN 1946-4274; TRN: US200615%%101
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Journal Volume: 893; Conference: Presented at: Materials Research Society, Boston, MA, United States, Nov 28 - Dec 02, 2005
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; AMPLITUDES; OPTICAL PROPERTIES; OXIDES; RAMAN SPECTROSCOPY; RESOLUTION; SPECTROPHOTOMETRY; SPECTROSCOPY; SUBSTRATES; THICKNESS; TIME DEPENDENCE; URANIUM; URANIUM OXIDES; WAVELENGTHS

Citation Formats

Caculitan, N, and Siekhaus, W J. The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy. United States: N. p., 2005. Web. doi:10.1557/PROC-0893-JJ05-07.
Caculitan, N, & Siekhaus, W J. The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy. United States. https://doi.org/10.1557/PROC-0893-JJ05-07
Caculitan, N, and Siekhaus, W J. 2005. "The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy". United States. https://doi.org/10.1557/PROC-0893-JJ05-07. https://www.osti.gov/servlets/purl/883532.
@article{osti_883532,
title = {The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy},
author = {Caculitan, N and Siekhaus, W J},
abstractNote = {Raman spectroscopy can be performed with micrometer resolution and can thus be used to determine the dependence of oxide thickness on the substrate's grain structure or local impurity inclusions. The Raman signal amplitude emitted from an epitaxial uranium oxide layer as a function of oxide thickness has been modeled for light of 632.8 nm wavelength incident on the oxide and reflected from the uranium substrate using the optical properties determined by spectrophotometry. The model shows that the Raman signal increases with oxide thickness and saturates at about 150 nm thickness. The model was compared with the measured Raman signal amplitude of an epitaxial uranium oxide layer growing in air with a known time dependence of oxide growth.},
doi = {10.1557/PROC-0893-JJ05-07},
url = {https://www.osti.gov/biblio/883532}, journal = {},
issn = {1946-4274},
number = ,
volume = 893,
place = {United States},
year = {Mon Dec 12 00:00:00 EST 2005},
month = {Mon Dec 12 00:00:00 EST 2005}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

Save / Share:

Works referenced in this record:

Characterisation of uranium oxides by micro-Raman spectroscopy
journal, January 1987


Raman spectra of stoichiometric and hyperstoichiometric uranium dioxide
journal, September 2003


Characterization of Uranium Oxides Using in Situ Micro-Raman Spectroscopy
journal, September 2000


The initial kinetics of uranium hydride formation studied by a hot-stage microscope technique
journal, November 1984