The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy
Abstract
Raman spectroscopy can be performed with micrometer resolution and can thus be used to determine the dependence of oxide thickness on the substrate's grain structure or local impurity inclusions. The Raman signal amplitude emitted from an epitaxial uranium oxide layer as a function of oxide thickness has been modeled for light of 632.8 nm wavelength incident on the oxide and reflected from the uranium substrate using the optical properties determined by spectrophotometry. The model shows that the Raman signal increases with oxide thickness and saturates at about 150 nm thickness. The model was compared with the measured Raman signal amplitude of an epitaxial uranium oxide layer growing in air with a known time dependence of oxide growth.
- Authors:
- Publication Date:
- Research Org.:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 883532
- Report Number(s):
- UCRL-CONF-217799
Journal ID: ISSN 1946-4274; TRN: US200615%%101
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Conference
- Resource Relation:
- Journal Volume: 893; Conference: Presented at: Materials Research Society, Boston, MA, United States, Nov 28 - Dec 02, 2005
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; AMPLITUDES; OPTICAL PROPERTIES; OXIDES; RAMAN SPECTROSCOPY; RESOLUTION; SPECTROPHOTOMETRY; SPECTROSCOPY; SUBSTRATES; THICKNESS; TIME DEPENDENCE; URANIUM; URANIUM OXIDES; WAVELENGTHS
Citation Formats
Caculitan, N, and Siekhaus, W J. The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy. United States: N. p., 2005.
Web. doi:10.1557/PROC-0893-JJ05-07.
Caculitan, N, & Siekhaus, W J. The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy. United States. https://doi.org/10.1557/PROC-0893-JJ05-07
Caculitan, N, and Siekhaus, W J. 2005.
"The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy". United States. https://doi.org/10.1557/PROC-0893-JJ05-07. https://www.osti.gov/servlets/purl/883532.
@article{osti_883532,
title = {The growth of epitaxial uranium oxide observed by micro-Raman spectroscopy},
author = {Caculitan, N and Siekhaus, W J},
abstractNote = {Raman spectroscopy can be performed with micrometer resolution and can thus be used to determine the dependence of oxide thickness on the substrate's grain structure or local impurity inclusions. The Raman signal amplitude emitted from an epitaxial uranium oxide layer as a function of oxide thickness has been modeled for light of 632.8 nm wavelength incident on the oxide and reflected from the uranium substrate using the optical properties determined by spectrophotometry. The model shows that the Raman signal increases with oxide thickness and saturates at about 150 nm thickness. The model was compared with the measured Raman signal amplitude of an epitaxial uranium oxide layer growing in air with a known time dependence of oxide growth.},
doi = {10.1557/PROC-0893-JJ05-07},
url = {https://www.osti.gov/biblio/883532},
journal = {},
issn = {1946-4274},
number = ,
volume = 893,
place = {United States},
year = {Mon Dec 12 00:00:00 EST 2005},
month = {Mon Dec 12 00:00:00 EST 2005}
}
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