Mitigation of substrate defects in reflective reticles using sequential coating and annealing

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874914

Mirkanimi, Paul B ^[1]

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1. Sunol, CA

A buffer-layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The buffer-layer is formed by either a multilayer deposited on the substrate or by a plurality of sequentially deposited and annealed coatings deposited on the substrate. The plurality of sequentially deposited and annealed coating may comprise multilayer and single layer coatings. The multilayer deposited and annealed buffer layer coatings may be of the same or different material than the reflecting coating thereafter deposited on the buffer-layer.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): US 6489066
• OSTI ID: 874914
• Country of Publication: United States
• Language: English

Related Subjects

mitigation
substrate
defects
reflective
reticles
sequential
coating
annealing
buffer-layer
minimize
size
reticle
prior
deposition
formed
multilayer
deposited
plurality
sequentially
annealed
coatings
single
layer
buffer
material
reflecting
thereafter
buffer layer
single layer
reflective coating
substrate prior
/430/378/