Filters for cathodic arc plasmas

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874808

Anders, Andre ^[1]; MacGill, Robert A ^[2]; Bilek, Marcela M. M. ^[3]; Brown, Ian G ^[4]

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1. Albany, CA
2. Richmond, CA
3. Engadine, AU
4. Berkeley, CA

Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
• DOE Contract Number: AC03-76SF00098
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): US 6465780
• OSTI ID: 874808
• Country of Publication: United States
• Language: English

Related Subjects

filters
cathodic
plasmas
contaminated
macroparticles
variety
magnetic
plasma
success
removing
open-architecture
bent
solenoid
filter
additional
field
coils
entrance
exit
improves
macroparticle
filtering
double-bent
twisted
plane
forms
compact
efficient
coil
flat
cross-section
promote
reflection
volume
output
conditioning
formed
expander
straightener
homogenizer
expanding
filtered
beam
cover
larger
target
deposition
ultrathin
amorphous
hard
carbon
a-c
films
storage
industry
magnetic filter
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