3-D photo-patterning of refractive index structures in photosensitive thin film materials

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874333

Potter, Kelly Simmons ^[1]

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1. Albuquerque, NM

A method of making a three-dimensional refractive index structure in a photosensitive material using photo-patterning. The wavelengths at which a photosensitive material exhibits a change in refractive index upon exposure to optical radiation is first determined and then a portion of the surface of the photosensitive material is optically irradiated at a wavelength at which the photosensitive material exhibits a change in refractive index using a designed illumination system to produce a three-dimensional refractive index structure. The illumination system can be a micro-lenslet array, a macroscopic refractive lens array, or a binary optic phase mask. The method is a single-step, direct-write procedure to produce a designed refractive index structure.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corporation (Albuquerque, NM)
• Patent Number(s): US 6368775
• OSTI ID: 874333
• Country of Publication: United States
• Language: English

Related Subjects

3-d
photo-patterning
refractive
index
structures
photosensitive
film
materials
method
three-dimensional
structure
material
wavelengths
exhibits
change
exposure
optical
radiation
determined
portion
surface
optically
irradiated
wavelength
designed
illumination
produce
micro-lenslet
array
macroscopic
lens
binary
optic
phase
mask
single-step
direct-write
procedure
refractive index
film material
sensitive material
photosensitive material
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