Focused ion beam source method and apparatus

Patent · Sat Jan 01 00:00:00 EST 2000

OSTI ID:873336

Pellin, Michael J ^[1]; Lykke, Keith R ^[2]; Lill, Thorsten B ^[3]

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1. Naperville, IL
2. Gaithersburg, MD
3. Sunnyvale, CA

A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.

• Research Organization: Argonne National Laboratory (ANL), Argonne, IL (United States)
• DOE Contract Number: W-31109-ENG-38
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 6137110
• OSTI ID: 873336
• Country of Publication: United States
• Language: English

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