Photodiode arrays having minimized cross-talk between diodes
- Madison, WI
Photodiode arrays are formed with close diode-to-diode spacing and minimized cross-talk between diodes in the array by isolating the diodes from one another with trenches that are formed between the photodiodes in the array. The photodiodes are formed of spaced regions in a base layer, each spaced region having an impurity type opposite to that of the base layer to define a p-n junction between the spaced regions and the base layer. The base layer meets a substrate at a boundary, with the substrate being much more heavily doped than the base layer with the same impurity type. The trenches extend through the base layer and preferably into the substrate. Minority carriers generated by absorption of light photons in the base layer can only migrate to an adjacent photodiode through the substrate. The lifetime and the corresponding diffusion length of the minority carriers in the substrate is very short so that all minority carriers recombine in the substrate before reaching an adjacent photodiode.
- Assignee:
- Wisconsin Alumni Research Foundation (Madison, WI)
- Patent Number(s):
- US 6133615
- Application Number:
- 09/059,141
- OSTI ID:
- 873318
- Country of Publication:
- United States
- Language:
- English
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migrate
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lifetime
corresponding
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recombine
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diode arrays
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photodiode arrays
p-n junction
heavily doped
diffusion length
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minority carrier
base layer
minority carriers
carriers generated
minimized cross-talk
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