High reflectance-low stress Mo-Si multilayer reflective coatings
- Livermore, CA
- Sunol, CA
A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 6110607
- OSTI ID:
- 873195
- Country of Publication:
- United States
- Language:
- English
Stress relaxation in Mo/Si multilayer structures
|
journal | June 1992 |
Variation in stress with background pressure in sputtered Mo/Si multilayer films
|
journal | August 1995 |
Multilayer sputter deposition stress control
|
journal | May 1996 |
Structural and residual stress changes in Mo/a-Si multilayer thin films with annealing
|
journal | January 1996 |
Similar Records
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications
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