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Title: Smooth diamond films as low friction, long wear surfaces

Patent ·
OSTI ID:872685

An article and method of manufacture of a nanocrystalline diamond film. The nanocrystalline film is prepared by forming a carbonaceous vapor, providing an inert gas containing gas stream and combining the gas stream with the carbonaceous containing vapor. A plasma of the combined vapor and gas stream is formed in a chamber and fragmented carbon species are deposited onto a substrate to form the nanocrystalline diamond film having a root mean square flatness of about 50 nm deviation from flatness in the as deposited state.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
DOE Contract Number:
W-31109-ENG-38
Assignee:
University of Chicago (Chicago, IL)
Patent Number(s):
US 5989511
OSTI ID:
872685
Country of Publication:
United States
Language:
English

References (19)

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