Ringfield lithographic camera

Patent · Thu Jan 01 00:00:00 EST 1998

OSTI ID:871832

Sweatt, William C ^[1]

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1. Albuquerque, NM

A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corporation (Albuquerque, NM)
• Patent Number(s): US 5805365
• OSTI ID: 871832
• Country of Publication: United States
• Language: English

Related Subjects

ringfield
lithographic
camera
projection
lithography
wide
optimized
efficient
extreme
ultraviolet
radiation
source
apprxeq
comprises
aspheric
mirrors
optically
arranged
common
axis
symmetry
increased
etendue
aperture
stop
accessible
plurality
partial
stops
synthesize
theoretical
mask
focused
form
reduced
image
wafer
relative
reflection
projection lithography
ultraviolet radiation
extreme ultraviolet
radiation source
common axis
camera comprises
lithographic camera
aspheric mirrors
aspheric mirror
lithography camera
/359/378/