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Title: Method for the production of atomic ion species from plasma ion sources

Patent ·
OSTI ID:871759

A technique to enhance the yield of atomic ion species (H.sup.+, D.sup.+, O.sup.+, N.sup.+, etc.) from plasma ion sources. The technique involves the addition of catalyzing agents to the ion discharge. Effective catalysts include H.sub.2 O, D.sub.2 O, O.sub.2, and SF.sub.6, among others, with the most effective being water (H.sub.2 O) and deuterated water (D.sub.2 O). This technique has been developed at Argonne National Laboratory, where microwave generated plasmas have produced ion beams comprised of close to 100% purity protons (H.sup.+) and close to 100% purity deuterons (D.sup.+). The technique also increases the total yield of protons and deuterons by converting unwanted ion species, namely, H.sub.2.sup.+,H.sub.3.sup.+ and D.sub.2.sup.+, D.sub.3.sup.+, into the desired ion species, H.sup.+ and D.sup.+, respectively.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
DOE Contract Number:
W-31109-ENG-38
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 5789744
OSTI ID:
871759
Country of Publication:
United States
Language:
English