Nanostructure multilayer dielectric materials for capacitors and insulators

Patent · Tue Apr 21 00:00:00 EDT 1998

OSTI ID:871490

Johnson, Gary W ^[1]

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1. Livermore, CA

A capacitor is formed of at least two metal conductors having a multilayer dielectric and opposite dielectric-conductor interface layers in between. The multilayer dielectric includes many alternating layers of amorphous zirconium oxide (ZrO.sub.2) and alumina (Al.sub.2 O.sub.3). The dielectric-conductor interface layers are engineered for increased voltage breakdown and extended service life. The local interfacial work function is increased to reduce charge injection and thus increase breakdown voltage. Proper material choices can prevent electrochemical reactions and diffusion between the conductor and dielectric. Physical vapor deposition is used to deposit the zirconium oxide (ZrO.sub.2) and alumina (Al.sub.2 O.sub.3) in alternating layers to form a nano-laminate.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 5742471
• Application Number: 08/755619
• OSTI ID: 871490
• Country of Publication: United States
• Language: English

Related Subjects

nanostructure
multilayer
dielectric
materials
capacitors
insulators
capacitor
formed
metal
conductors
opposite
dielectric-conductor
interface
layers
alternating
amorphous
zirconium
oxide
zro
alumina
engineered
increased
voltage
breakdown
extended
service
life
local
interfacial
function
reduce
charge
injection
increase
proper
material
choices
prevent
electrochemical
reactions
diffusion
conductor
physical
vapor
deposition
deposit
form
nano-laminate
service life
multilayer dielectric
dielectric materials
breakdown voltage
metal conductor
alternating layers
vapor deposition
chemical reaction
physical vapor
zirconium oxide
dielectric material
chemical reactions
electrochemical reaction
voltage breakdown
metal conductors
electrochemical reactions
interface layer
interface layers
metal conduct
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