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Title: Precision cleaning apparatus and method

Patent ·
OSTI ID:871319
 [1];  [2];  [1]
  1. Albuquerque, NM
  2. Cedar Crest, NM
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A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5706840
OSTI ID:
871319
Country of Publication:
United States
Language:
English

References (6)

Electrochemical quartz crystal microbalance studies of adsorption and desorption of self-assembled monolayers of alkyl thiols on gold journal December 1993
Effect of surface roughness on the response of thickness-shear mode resonators in liquids journal October 1993
Characterization of a thickness‐shear mode quartz resonator with multiple nonpiezoelectric layers journal February 1994
Applications of the quartz crystal microbalance to electrochemistry. Measurement of ion and solvent populations in thin films of poly(vinylferrocene) as functions of redox state journal March 1987
Cleaning up our act: Alternatives for hazardous solvents used in cleaning report January 1994
Characterization of a quartz crystal microbalance with simultaneous mass and liquid loading journal October 1991

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Related Subjects

precision
cleaning
apparatus
method
monitor
comprising
acoustic
wave
sensor
quartz
crystal
microbalance
qcm
flexural
plate
fpw
shear
horizontal
mode
sh-apm
surface
sh-saw
measurement
means
connectable
measuring
in-situ
electrical
response
characteristics
vary
removal
contaminants
workpiece
located
adjacent
methods
disclosed
determines
cleanliness
residual
contamination
determining
effectiveness
medium
removing
acoustic plate
flexural plate
plate wave
surface acoustic
acoustic wave
located adjacent
quartz crystal
cleaning apparatus
crystal microbalance
horizontal surface
plate mode
precision cleaning
response characteristic
electrical response
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