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Title: Flow-through ion beam source

Patent ·
OSTI ID:870819
 [1]
  1. Los Alamos, NM
+ Show Author Affiliations

A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
DOE Contract Number:
W-7405-ENG-36
Assignee:
Regents of University of California, Office of Technology (Alameda, CA)
Patent Number(s):
US 5601654
OSTI ID:
870819
Country of Publication:
United States
Language:
English

References (1)

Technology of ion beam sources used in sputtering journal March 1978

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Related Subjects

flow-through
beam
source
method
apparatus
forming
charge
neutral
useful
producing
films
material
electrically
conductive
non-conductive
substrates
provided
conductive substrate
electrically conductive
beam source
non-conductive substrate
charge neutral
non-conductive substrates
/118/156/250/427/438/