Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks
- Rice Univ., Houston, TX (United States). Dept. of Materials Science
- Nano Instruments, Inc., Knoxville, TN (United States)
- IBM Storage Systems Division, San Jose, CA (United States)
- Lawrence Berkeley Lab., CA (United States)
Nanoindentation and nanoscratching experiments have been performed to assess the mechanical properties of several carbon thin films with potential application as wear resistant coatings for magnetic disks. These include three hydrogenated-carbon films prepared by sputter deposition in a H{sub 2}/Ar gas mixture (hydrogen contents of 20, 34, and 40 atomic %) and a pure carbon film prepared by cathodic-arc plasma techniques. Each film was deposited on a silicon substrate to thickness of about 300 run. The hardness and elastic modulus were measured using nanoindentation methods, and ultra-low load scratch tests were used to assess the scratch resistance of the films and measure friction coefficients. Results show that the hardness, elastic modulus, and scratch resistance of the 20 and 34% hydrogenated films are significantly greater than the 40% film, thereby showing that there is a limit to the amount of hydrogen producing beneficial effects. The cathodic-arc film, with a hardness of greater than 59 GPa, is considerably harder than any of the hydrogenated films and has a superior scratch resistance.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Oak Ridge Associated Universities, Inc., TN (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States); Oak Ridge Inst. for Science and Education, TN (United States)
- DOE Contract Number:
- AC05-84OR21400; AC05-76OR00033; AC03-76SF00098
- OSTI ID:
- 87071
- Report Number(s):
- CONF-950412-16; ON: DE95013211
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 17-21 Apr 1995; Other Information: PBD: [1995]
- Country of Publication:
- United States
- Language:
- English
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