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Title: Complementary junction heterostructure field-effect transistor

Patent ·
OSTI ID:870224

A complimentary pair of compound semiconductor junction heterostructure field-effect transistors and a method for their manufacture are disclosed. The p-channel junction heterostructure field-effect transistor uses a strained layer to split the degeneracy of the valence band for a greatly improved hole mobility and speed. The n-channel device is formed by a compatible process after removing the strained layer. In this manner, both types of transistors may be independently optimized. Ion implantation is used to form the transistor active and isolation regions for both types of complimentary devices. The invention has uses for the development of low power, high-speed digital integrated circuits.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5479033
OSTI ID:
870224
Country of Publication:
United States
Language:
English

References (12)

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Complementary heterostructure insulated gate field effect transistors (HIGFETs) conference January 1985
Double-implanted GaAs complementary JFET's journal January 1984
Quantum-well p-channel AlGaAs/InGaAs/GaAs heterostructure insulated-gate field-effect transistors journal November 1989
Anisotype-gate self-aligned p-channel heterostructure field-effect transistors journal January 1993
High-transconductance p-channel InGaAs/AlGaAs modulation-doped field effect transistors journal March 1987
Complementary GaAs junction-gated heterostructure field effect transistor technology conference January 1994
Complementary circuit with AlGaAs/GaAs heterostructure MISFETs employing high-mobility two-dimensional electron and hole gases journal January 1985