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Title: Method of fabricating silicon carbide coatings on graphite surfaces

Patent ·
OSTI ID:869406

The vacuum plasma spray process produces well-bonded, dense, stress-free coatings for a variety of materials on a wide range of substrates. The process is used in many industries to provide for the excellent wear, corrosion resistance, and high temperature behavior of the fabricated coatings. In this application, silicon metal is deposited on graphite. This invention discloses the optimum processing parameters for as-sprayed coating qualities. The method also discloses the effect of thermal cycling on silicon samples in an inert helium atmosphere at about 1600.degree.C. which transforms the coating to silicon carbide.

Research Organization:
EG & G IDAHO INC
DOE Contract Number:
AC07-76ID01570
Assignee:
United States as represented by United States Department of (Washington, DC)
Patent Number(s):
US 5332601
OSTI ID:
869406
Country of Publication:
United States
Language:
English

References (2)

Vacuum-plasma-sprayed silicon coatings journal December 1991
Plasma-Sprayed Coatings journal September 1988