Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching
Patent
·
OSTI ID:868069
- Albuquerque, NM
A photolithographic method for treating an article formed of polymeric material comprises subjecting portions of a surface of the polymeric article to ionizing radiation; and then subjecting the surface to chemical etching. The ionizing radiation treatment according to the present invention minimizes the effect of the subseuent chemical etching treatment. Thus, selective protection from the effects of chemical etching can be easily provided. The present invention has particular applicability to articles formed of fluorocarbons, such as PTFE. The ionizing radiation employed in the method may comprise Mg(k.alpha.) X-rays or lower-energy electrons.
- Research Organization:
- AT&T
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 5066565
- OSTI ID:
- 868069
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
selective
protection
poly
tetra-fluoroethylene
effects
chemical
etching
photolithographic
method
treating
article
formed
polymeric
material
comprises
subjecting
portions
surface
ionizing
radiation
treatment
according
minimizes
effect
subseuent
easily
provided
particular
applicability
articles
fluorocarbons
ptfe
employed
comprise
mg
alpha
x-rays
lower-energy
electrons
energy electrons
chemical etching
polymeric material
ionizing radiation
material comprises
energy electron
polymeric article
articles formed
comprises subjecting
/430/216/
protection
poly
tetra-fluoroethylene
effects
chemical
etching
photolithographic
method
treating
article
formed
polymeric
material
comprises
subjecting
portions
surface
ionizing
radiation
treatment
according
minimizes
effect
subseuent
easily
provided
particular
applicability
articles
fluorocarbons
ptfe
employed
comprise
mg
alpha
x-rays
lower-energy
electrons
energy electrons
chemical etching
polymeric material
ionizing radiation
material comprises
energy electron
polymeric article
articles formed
comprises subjecting
/430/216/