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Title: Apparatus and method for the horizontal, crucible-free growth of silicon sheet crystals

Patent ·
OSTI ID:866181

Apparatus for continuously forming a silicon crystal sheet from a silicon rod in a noncrucible environment. The rod is rotated and fed toward an RF coil in an inert atmosphere so that the upper end of the rod becomes molten and the silicon sheet crystal is pulled therefrom substantially horizontally in a continuous strip. A shorting ring may be provided around the rod to limit the heating to the upper end only. Argon gas can be used to create the inert atmosphere within a suitable closed chamber. By use of this apparatus and method, a substantially defect-free silicon crystal sheet is formed that can be used for microcircuitry chips or solar cells.

Research Organization:
Midwest Research Institute, Kansas City, MO (United States)
DOE Contract Number:
AC02-83CH10093
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 4650541
OSTI ID:
866181
Country of Publication:
United States
Language:
English