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Title: Method for forming p-n junctions and solar-cells by laser-beam processing

Patent ·
OSTI ID:863317

This invention is an improved method for preparing p-n junction devices, such as diodes and solar cells. High-quality junctions are prepared by effecting laser-diffusion of a selected dopant into silicon by means of laser pulses having a wavelength of from about 0.3 to 1.1 .mu.m, an energy area density of from about 1.0 to 2.0 J/cm.sup.2, and a duration of from about 20 to 60 nanoseconds. Initially, the dopant is deposited on the silicon as a superficial layer, preferably one having a thickness in the range of from about 50 to 100 A. Depending on the application, the values for the above-mentioned pulse parameters are selected to produce melting of the silicon to depths in the range from about 1000 A to 1 .mu.m. The invention has been used to produce solar cells having a one-sun conversion efficiency of 10.6%, these cells having no antireflective coating or back-surface fields.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 4147563
OSTI ID:
863317
Country of Publication:
United States
Language:
English